RIE Training by Sntek

Date: 20 April 2010

Place: Microelectronic Lab.

Time: 10am-5pm

• RIE Training note.. Please [click here]
  
• ICP introduction.. Please [click here]

Magnetron Sputtering Training

• Magnetron Sputtering Training Note...Please click [here]

Nanotechnology Journal's collection (April 10) Vol. (10)

1. Electron Beam dose calculation
2. Electron Beam Melting of Advanced Materials
3. EXPERIMENT 31 The Sem
4. Electron-beam lithography simulation for EUV mask applications
5. Influence of Electron Beam Irradiation
6. Nano-Scale Machining Via EB AND LASER PROCESSING
7. NONLINEAR BEAM DYNAMICS STUDY WITH MATLAB 
8. The Advantages of EB
9. THE ELECTRON BEAM MEASUREMENTS 
10. SIMULATION AND E-BEAM PATTERNING OF SINGLE ELECTRON TRANSISTOR

Colloqium Research Series( X-Ray Photoelectron Spectrometer)

X-Ray Photoelectron Spectrometer Explanation By Dr Zaidi[click here]